PFI stands for “Prototype Formation and Integration” and is an Open User Facility at Center for Physical Sciences and Technology (FTMC), Lithuania. We offer a complete solution for Research and Development in semiconductor field covering III-V group elements. We have:
Implemented ISO 9001 quality standards;
ISO5 and ISO7 cleanroom facilities:
Two molecular beam epitaxy reactors for III-V compounds;
Thin film deposition and etching
- Magnetron sputtering system
- E-beam sputtering system
- Double tube PECVD for SiNx, SiO2, Al2O3, SiC, graphene
- Chlorine chemistry ICP RIE system
- Fluorine chemistry RIE system
- PECVD reactor for SiNx, SiO2 coatings
Lithography
- Laser Lithography system with 600nm resolution
- Mask Aligner 0.8um resolution.