About PFI

PFI stands for “Prototype Formation and Integration” and is an Open User Facility at Center for Physical Sciences and Technology (FTMC), Lithuania. We offer a complete solution for Research and Development in semiconductor field covering III-V group elements. We have:

Implemented ISO 9001 quality standards;

ISO5 and ISO7 cleanroom facilities:

Two molecular beam epitaxy reactors for III-V compounds;

Thin film deposition and etching

  • Magnetron sputtering system
  • E-beam sputtering system
  • Double tube PECVD for SiNx, SiO2, Al2O3, SiC, graphene
  • Chlorine chemistry ICP RIE system
  • Fluorine chemistry RIE system
  • PECVD reactor for SiNx, SiO2 coatings


  • Laser Lithography system with 600nm resolution
  • Mask Aligner 0.8um resolution.