PFI stands for “Prototype Formation and Integration” and is an Open User Facility of Optoelectronics department at Center for Physical Sciences and Technology (FTMC), Lithuania. We offer a complete solution for Research and Development in semiconductor field covering III-V group elements. We have:
Implemented ISO 9001 quality standards;
ISO5 and ISO7 cleanroom facilities:
Two molecular beam epitaxy reactors for III-V compounds;
Thin film deposition
- Magnetron sputtering system
- E-beam sputtering system
- Double tube PECVD for SiNx, SiO2, Al2O3, SiC, graphene.
- Laser Lithography system Heidelberg instruments DWL 66+ with 600nm resolution
- Karl Suss MJB3 mask aligner 1.5um resolution.
Arriving in 6 months:
Chlorine chemistry ICP RIE system;
Fluorine chemistry ICP RIE system;
PECVD reactor for SiNx, SiO2 coatings;
New mask aligner (up to 5’’, 1µm resolution)
Molecular Beam Epitaxy
Device Prototype development
Photolitography, etching, photo mask making .
Various configuration contact formation using magnetron and electron beam sputtering. Metal oxide films on various substrates.
Small Scale Manufacturing
PFI has collaboration with multiple partners for access to wider expertise and services.