{"id":805,"date":"2018-07-13T07:05:41","date_gmt":"2018-07-13T07:05:41","guid":{"rendered":"http:\/\/pfi.ftmc.lt\/?page_id=805"},"modified":"2018-07-13T09:10:07","modified_gmt":"2018-07-13T09:10:07","slug":"metal-and-contact-deposition","status":"publish","type":"page","link":"https:\/\/pfi.ftmc.lt\/?page_id=805&lang=en","title":{"rendered":"Metal and Contact Deposition"},"content":{"rendered":"

Electron-Beam evaporation station (<\/strong>VST Model TFDS\u2013870<\/strong>)<\/strong><\/h2>\n

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Electron-Beam evaporation station consists of a glove box and a growing chamber. Firstly, the samples are put in to the “Glove Box”, which is filled with nitrogen gas. The growing chamber is used to grow thin-films of various materials on the samples. Also, this machine is used to grow contacts on the wafers of various materials such as Au, AuGe12%, Ge, Ti, Ni and Al. The maximum diameter of the sample is 2 inches. The wafer holder has four pins to hold the sample. If samples are of smaller dimensions than 2 inches then we can put 4 of them at the same time, but total area should not exceed 2 inches. Also is possible to heat the substrates up to 150 \u00b0 C. The sample holder can be rotated (0-28 rpm), which would ensure the uniformity of the coated layer on the sample. Thin-film thickness and deposition rate is controlled with Telemark (Model 880) controller. Parameters: sensor crystal frequency is 6 MHz, resolution \u00a0Hz (5 MHz \u2013 6 MHz), the measurement speed is 10 measurements\/second, accuracy thickness per single count. Most frequently we use 2 A\/s deposition rate. Using samples with zinc (Zn) is strictly forbidden<\/strong>!<\/p>\n

Examples:<\/strong><\/p>\n